MCG expands Lithomax production for ArF & EUV photoresists in Japan

Photosensitive polymers are resins that form the main component of the photoresists used in the photolithography process to copy a semiconductor’s circuit pattern onto a wafer. With their low metal and impurity contents, MCG Group’s Lithomax  products meet the high quality required for the miniaturization of semiconductor circuits and are used by many photoresist manufacturers. With ArF and EUV photoresists — a still growing market dominated by Japanese manufacturers — holding the key to further miniaturization, the demand for Lithomax  as raw materials is expected to steadily grow in future.

In response to this anticipated increase in demand and to strengthen the supply chain, MCG Group has decided to establish a new production facility for Lithomax  at its Kyushu-Fukuoka Plant to supplement the current production at the Kanto-Tsurumi Plant in Yokohama, Kanagawa. This will more than double the production capacity of Lithomax  for ArF photoresists, and also signal the start of mass production of Lithomax  for EUV photoresists.

With a wide range of materials and services to support semiconductor manufacturing, MCG Group will continue to contribute to the industry with a stable, high quality supply.

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Fibre2Fashion News Desk (HU)